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专利名称：Preparation of topcoat compositions and
methods of use thereof
发明人：Hiroshi Ito,Linda Karin Sundberg申请号：US11159477申请日：20050623
公开号：US20060292484A1公开日：20061228
专利附图：
摘要：A topcoat composition that includes a fluorine-containing polymer and a castingsolvent selected from an alcohol is provided. Also provided is a method of forming animage on a photoresist that includes forming a photoresist over a substrate; applying a
topcoat composition, the topcoat composition comprising at least one fluorine-containing polymer and a casting solvent, onto the photoresist; removing the castingsolvent of the topcoat composition resulting in the formation of a topcoat material overthe photoresist; exposing the photoresist to radiation, the radiation changing a chemicalcomposition of the regions of the photoresist exposed to the radiation, forming exposedand unexposed regions in the photoresist; and removing i) the topcoat material and ii) theexposed regions of the photoresist or the unexposed regions of the photoresist.
申请人：Hiroshi Ito,Linda Karin Sundberg
地址：San Jose CA US,Los Gatos CA US
国籍：US,US
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