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专利名称：Micromechanical and microoptomechanical
structures with single crystal siliconexposure step
发明人：Andrew J. Zosel,Joel A. Kubby,Peter M.
Gulvin,Chuang-Chia Lin,Jingkuang Chen,AlexT. Tran
申请号：US10193804申请日：20020711公开号：US06661070B2公开日：20031209
专利附图：
摘要：The present invention provides a micromechanical or microoptomechanicalstructure. The structure is produced by a process comprising defining a structure on asingle crystal silicon layer separated by an insulator layer from a substrate layer;depositing and etching a polysilicon layer on the single crystal silicon layer, with
remaining polysilcon forming mechanical or optical elements of the structure; exposing aselected area of the single crystal silicon layer; and releasing the formed structure.
申请人：MICROSCAN SYSTEMS, INC.,XEROX CORPORATION
代理机构：Blakely, Sokoloff, Taylor & Zafman, LLP
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