专利内容由知识产权出版社提供
专利名称：Gas actuating device发明人：Ichida, Tadashi申请号：EP00103272.1申请日：20000217公开号：EP1035010A3公开日：20020605
专利附图：
摘要：A gas actuating device (2) includes a housing (4) having a gas applying chamber(6), an actuator chamber (8) and a gas applying passage for communicating gas from thegas applying chamber (6) to the actuator chamber (8). An actuating member (12) having afirst side (22) and a second side (24) is disposed in the actuator chamber (8), wherein the
first side (22) of the actuating member (12) receives gas pressure from gas applied to theactuating chamber (8) from the gas applying passage (6). The actuating member (12)moves in a first direction in response to the gas pressure applied to the first side (22) ofthe actuating member (12). A valve (31) selectively communicates compressed gas fromthe gas applying chamber (6) to the actuator chamber (8) through the gas applyingpassage (10) for moving the actuating member (12) in the first direction, and a gas releasepassage (11) communicates gas from the actuator chamber (8) at the first side (22) of theactuating member (12) to an outside of the actuator chamber (8).
申请人：SHIMANO INC.
地址：77, Oimatsucho 3-cho Sakai-shi Osaka JP
国籍：JP
代理机构：Grosse, Wolfgang, Dipl.-Ing.
更多信息请下载全文后查看
